Due to its high flow rate, high accuracy, excellent cleanliness control and structural stability, it is ideal for use in the critical filtration stages of semiconductor front-end and back-end processes. Compared to traditional meltblown or folded cartridges, they offer better cost performance and reliability for high capacity and ultra-pure requirements.
In the electronics and semiconductor industries, core applications for industrial water filters include ultrapure water (UPW) systems, developer filtration, etchant filtration, chemical-mechanical milling (CMP) and wet cleaning systems. In UPW systems, multi-stage self-cleaning filters and precision cartridges (e.g., 0.01μm PP/PTFE) effectively remove particles and metal ions, ensuring water quality up to ppb or even ppt levels, while reducing energy consumption and extending resin life. Developer filtration requires high pressure chemical resistant cartridges (e.g. Nylon 66) to eliminate particles of ≤0.1μm, avoiding photolithography defects, with some cases showing a reduction in defect rates from 3.5% to 0.8%. Etch solution filtration relies on titanium alloy shells and PTFE membranes to withstand strong acids, and charged cartridges (e.g., ZrO₂-modified) to adsorb metal ions, improving etch uniformity by up to 22%.CMP polishing solution processing uses a high-flow cyclone self-cleaning system to pre-filter ≥5μm particles, and a 0.5μm end-filter cartridge to prevent wafer scratches. The wet cleaning system, on the other hand, ensures <10 particles/wafers in the SC1/SC2 solution through multi-stage tandem filtration (1μm → 0.1μm → ion exchange), while the PVDF filter housing resists NH₄OH corrosion. The solution is strictly SEMI compliant and integrates IoT smart monitoring to optimise maintenance cycles, directly addressing critical needs such as wafer rework rates, chemical compatibility and particle control.
Semiconductor manufacturing processes (e.g. photolithography, etching, deposition, wafer cleaning) require extremely high water quality to meet the following standards:
Ultrapure water indicators:
Resistivity ≥ 18.2 MΩ・cm (25 ℃)
Total organic carbon (TOC) <5 ppb
Particulate contaminants: ≥0.1μm particles <1 / mL (ISO 14644-1 Class 5 clean room standards)
Microbiological content: <1 CFU/mL
High flow rate stability:
The water consumption of a single production line can be up to 50-200 m³/h, which requires the filter to keep the filtration precision and pressure loss stable under high flow rate to avoid affecting the consistency of the process due to the fluctuation of water flow.
Corrosion resistance and cleanliness:
The material in contact with the fluid should be ultra-pure stainless steel (e.g. 316L BA/EP polished) or PFA plastic, so as to avoid the precipitation of metal ions or particle shedding and contamination of water quality.
| Type: | Filter Cartridge |
|---|---|
| Usage: | Environmental Protection, Chemical Industry, Power/Paper/Steel/Petro-Chemical Plant |
| Motive Force: | Pressure |
| Style: | Vertical |
| Performance: | Sophisticated Filters |
| Certification: | ISO9001:2015 |
Introduce:
The high flow filter element uses deep fine polypropylene or fiberglass membrane as the filter material, with a large diameter of 6 inches/152mm, no center rod, one-way opening, and specially designed liquid flow from inside to outside, ensuring that all pollutant particles are intercepted inside the filter element. The design of super large flow rate significantly reduces the usage of filter elements and filters in the same flow rate application, greatly saving equipment investment costs and labor costs.
Product Features:
1. The combination of surface filtration and deep filtration can significantly reduce the number of filter elements and significantly reduce the size of the supporting shell compared to ordinary filter elements;
2. The filter layer is made of high-efficiency and low resistance materials, which can achieve ultra-high filtration efficiency of over 99% and extend the service life of the filter element;
3. The design of the convenient handle significantly reduces the time for replacing the filter element, making the replacement of the filter element simple and portable.
4. The overall polypropylene design and hot melt welding treatment effectively prevent the end cover from falling off and secondary pollution.
5. The design of the sealing interface reduces the risk of side flow and ensures the sealing and reliability of filtration;
6. The foldable design increases the filtration area, resulting in a significantly lower pressure drop than ordinary filter elements,
7. The design with a large diameter increases the capacity for pollutants, prolongs the service life, and reduces production costs;
8. Equipped with a skeleton to enhance the pressure resistance of the filter element during use;
Typical applications:
High Flow Z filters’ proprietary depth filter matrix provides unmatched performance in these
Applications
RO pre-filtration
Well injection
Produced water filtration
Water flood / enhanced oil recovery
Amine filtration
Seawater filtration
General properties:
High Flow Z filters are available with two nominal and four absolute pore size ratings. They are made of 100% polypropylene construction. Tables 1, 2 and 3 show additional specifications and performances.
Related Products:
3M High Flow Filter
Pall High Flow Filter
Parker High Flow Filter
